Plasma-enhanced film deposition

ABSTRACT

The invention provides methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments, an electrode is positioned in the deposition chamber and has an interior cavity in which first and second magnet systems are disposed. In certain embodiments, there is provided a method for depositing films onto substrates using a deposition chamber of the described nature. The invention also provides electrode assemblies for film-deposition equipment. In certain embodiments, the electrode assembly comprises a rotatable electrode (optionally having an outer coating of carbon or the like) having an interior cavity, with stationary first and second generally-opposed magnet systems being disposed in this interior cavity.

FIELD OF THE INVENTION

The present invention relates to deposition of films on glass and othersubstrates. More particularly, this invention relates to plasma-enhanceddeposition of films on glass and other substrates.

BACKGROUND OF THE INVENTION

In the coated glass industry, it is often desirable to apply one or morethin layers of coating material to glass to impart desired properties inthe resulting coated glass. For example, infrared-reflective coatings(e.g., low-emissivity coatings) are commonly applied to glass sheets.Coatings of many different types are used to impart in coated substratesdesired properties, such as particular levels of transmissivity,reflectivity, absorptivity, emissivity, shading performance, color,durability, hydrophilicity, hydrophobicity, and photoactivity.

A variety of coatings are applied to glass for use in architectural andautomotive applications. These coatings are commonly applied using“in-line” vacuum coaters with magnetron sputtering sources. For example,cylindrical magnetrons are used in many sputter deposition methods. Inthese methods, a substrate is positioned in a vacuum chamber containingat least one cylindrical target. Cylindrical targets are well known inthe present art and commonly take the form idealized in FIGS. 4A and 4B.The cylindrical target 180 comprises a backing tube 182 carrying a thickouter layer of sputterable target material 185. The backing tube 182 istypically a rigid, elongated tube of electrically-conductive material(e.g., metal), which may be coated with a relatively thin bonding layer184. A stationary magnet assembly 170 is typically positioned within theinterior cavity 188 of the rotatable target 180. This magnet assembly170 confines plasma in the chamber to a region adjacent the target 180.The target 180 is commonly mounted in the chamber to a pair of opposedend blocks (cantilever end block systems are also known), with each endblock being adapted to hold one of the ends 189 of the backing tube 182.

During sputtering, an electrical field is typically created between acathode and an anode in the sputtering chamber. Commonly, the sputteringtarget functions as the cathode and at least one separate anode isprovided in the chamber at a location spaced away from the target. Forexample, a separate bar or another electrically-conductive member mayfunction as the anode. Gas is delivered to the chamber to facilitateproducing a plasma (e.g., a glow discharge). Electrons accelerate in theelectrical field, gaining enough energy to ionize the gas atoms andcreate the plasma. Positively-charged particles (e.g., ions) in theplasma are attracted to the cathodic target, bombarding it and causingparticles (e.g., atoms) of the target material to be ejected from thetarget. As sputtering continues, more and more particles are emittedfrom the target, causing erosion of the layer of target material 185.Eventually, the useful target material is depleted and the target mustbe replaced.

Thus, the continuity of the sputtering process is limited by the amountof useful target material on the target. Generally, sputtering is onlycontinued until the useful target material is consumed, at which pointeach consumed target is no longer used. Thus, the sputtering processmust be shut down periodically and the consumed targets replaced. Thisprevents manufacturers from operating their astronomically expensivesputtering lines (e.g., costing many millions of dollars) on acontinuous, uninterrupted basis.

The coatings (e.g., low-emissivity coatings) used for architectural andautomotive applications commonly comprise metal film and transparentdielectric film. When depositing metal film, a metal target is typicallysputtered in the presence of inert gas, such as argon. When depositingdielectric film, a metal target is commonly sputtered in the presence ofa reactive gas (e.g., oxygen or nitrogen). Thus, a reaction product(e.g., a metal oxide or metal nitride) of the metal target material andthe reactive gas is deposited on the substrate. In some cases,dielectric films are alternatively deposited by sputtering ceramictargets in substantially inert atmospheres (optionally containing somereactive gas).

Thus, in depositing low-emissivity coatings and many other types ofcoatings, each substrate is commonly passed through a series ofconnected sputtering chambers (i.e., a sputtering line), wherein some ofthe chambers are adapted for depositing metal films and others areadapted for depositing dielectric films. Unfortunately, the continuityof the sputtering process in both types of chambers is limited by theneed to replace consumed targets. The continuity of sputtering inchambers adapted for depositing dielectric films is even more severelylimited, as will now be discussed.

During sputtering, an undesirable contamination layer builds up on thewalls and other interior surfaces of the sputtering chamber. Ejectedparticles of target material are deposited on the substrate and,unfortunately, on other exposed surfaces within the sputtering chamber(walls, anodes, shields, rollers, etc.). Over time, a layer of sputteredmaterial (i.e., a “contamination layer” or an “overcoat”) builds up onthe interior surfaces of the chamber. This is particularly problematicin chambers where dielectric films are deposited.

The contamination layer grows increasingly thick as sputtering iscontinued. As the thickness of this layer increases, its internal stressbuilds up until the point is reached where flakes begin to spall fromthe contamination layer. When this occurs, some of the spalling flakescan fall upon a freshly-deposited coating on the substrate, leavinginclusions or pinholes in the coating. This can be a problem in chamberswhere dielectric films are deposited, because dielectric films tend notto adhere to the interior chamber surfaces as well as metal films. Thisproblem is exacerbated by the fact that a dielectric contamination layeris electrically nonconductive and can cause arcing, which can causelarger chunks to fall from the contamination layer onto the substrate.

Growth of an electrically nonconductive contamination layer on theanode(s) in a sputtering chamber can cause particular problems.Transparent dielectric films are commonly insulators, semiconductors, orother electrically nonconductive materials (e.g., Si₃N₄, SiO₂, TiO₂,ZnO, SnO₂, and Al₂O₃). The accumulation of such materials on an anode ina sputtering chamber initiates a progressive slowing of the sputteringprocess, which can ultimately result in a shut-down of the process. Thisphenomenon is commonly referred to as the “vanishing” or “poisoned”anode problem. A nonconductive contamination layer on the anode inhibitsand eventually prevents charge carriers from flowing between the anodeto the cathode. This has the effect of first reducing and eventuallystopping the sputtering process. This also results in the conductivearea of the anode changing in size during sputtering, thus rendering thesputtering process more difficult to control and potentially leavingnon-uniformities among deposited coatings.

Growth of a dielectric contamination layer can complicate the sputteringprocess in further respects. For example, the charged plasma can berepulsed from the contamination layer due to like polarity of plasmaparticles and areas of contamination. As this repulsion increases, thedistribution of the plasma may change as it “searches” for a conductiveoutlet. Moreover, as the conductive areas in the chamber become randomlydistributed, the uniformity of the plasma discharge can deteriorate,thereby slowing the sputtering process. This non-uniformity of theplasma discharge can complicate process control and reduce the qualityand uniformity of deposited films.

Growth of a contamination layer on the gas distribution system in asputtering chamber can also cause particular problems. For example, whenenough contamination builds up on gas delivery ports (e.g., so as toprevent gas from being delivered freely into the chamber), thesputtering process can be slowed due to insufficient plasma generation.In particular, when enough contamination builds up on the gas deliveryports in reactive sputtering, there may be insufficient reaction betweenthe sputtered material and the reactive gas. Thus, the deposited filmsmay be more metallic than is desired. This can make it difficult todeposit films meeting desired product specifications. It can alsocomplicate controlling the process stability and sputtering rate.

To combat the foregoing problems, manufacturers periodically shut downtheir coaters and clean the contamination layer off the interiorsurfaces of each chamber. This involves venting each chamber, carefullycleaning it (e.g., sandblasting, scraping, or otherwise manuallyremoving the contamination layer), and then re-evacuating the chamber.Consumed targets are typically replaced while the chambers are open forcleaning. The chamber cleaning process takes a great deal of time andeffort. It is estimated that manufacturers lose as much as 40% of theirpotential production time to chamber clean-ups and target change-outs.This down-time is extremely expensive given the staggering cost ofindustrial sputtering equipment. Thus, it can be appreciated that acontinuous coating process would provide an outstanding boost inproductivity.

The foregoing problems can be aggravated when manufacturers try tostretch the productive operating period of a coater. At the end of theproductive period for a given chamber, the plasma discharge searches foruncontaminated areas in the chamber. To keep the plasma dischargeactive, manufacturers sometimes deliver extra gas into the chamber. Thiscan be risky for manufacturers, as the extra gas can create a nucleationcurtain or a clustering of sputtered material. As a result, electricalcurrent can be directed to flow through the nucleation curtain into thegas distribution system seeking a path back to the power supply, therebycausing arcing that can melt the gas pipe, etc. In addition tonecessitating the installation of new gas pipes, this can have adverseeffects on the sputtering process.

Solutions have been proposed to some of the foregoing problems. Oneproposed solution is disclosed in U.S. Pat. No. 4,863,756, issued toHartig et al., the entire contents of which are incorporated herein byreference. This Hartig patent describes methods and equipment forapplying coating to a moving substrate. In this patent, gas is deliveredto a deposition chamber and is converted to a plasma. Oneupwardly-oriented magnet assembly is used to create a magnetic trap thatconfines the plasma to a localized area above the moving substrate.Immediately above the magnet assembly is a plate-shaped electrodeconnected to a voltage source. The voltage source is either adirect-current source or a high-frequency source with a frequency ofapproximately 13.56 MHz. Two reels guide the substrate in a horizontalpath of travel directly above the electrode. Above the path of substratetravel is a gas-delivery system that provides reaction gas. Inoperation, the substrate is conveyed over the electrode, the electrodeconverts the gas into plasma, the system of magnets holds the plasmaadjacent the substrate, and the plasma creates a chemical reactionand/or decomposition by which coating is deposited on the substrate.Since the plasma is trapped adjacent the substrate, the conversion ofreaction gas to coating occurs only in the immediate vicinity of themagnets (e.g., directly over the substrate). Thus, coating is depositedover the substrate, but not over interior chamber surfaces remote fromthe magnetic trap.

In another embodiment, Hartig discloses a rotatable guide roller thatdoubles as an electrode. In the interior of this guide roller, there isone stationary, upwardly-oriented magnet assembly that is used to createthe magnetic trap. During operation, a continuous flexible substrate ispassed over the guide roller as it is rotated. In this embodiment, anyunwanted coating that accumulates on the electrode is spread over itslarge cylindrical surface.

This solution is well suited for coating substrates in reel-to-reelapplications (e.g., thin metal film or thin insulating film suppliedfrom a reel, coated, and collected on a wind-up reel). In suchapplications, the disclosed solution is useful for avoiding productionstoppages for chamber cleaning. This solution also obviates the need fortargets as source material. Thus, there are no targets or targetchange-outs, only continuous conversion of gas into solid coatings, andonly on areas of the substrate within the magnetic trap. Unfortunately,this solution has significant limitations.

For example, this solution is effectively limited to coating continuousfilm-like substrates in reel-to-reel applications. In the case of glass,coating is commonly performed upon spaced-apart sheets, wherein gaps areleft between adjacent sheets. These gaps may account for as much as 30%of the available load area on industrial sputtering lines (e.g., loadfactors of 70% are not uncommon). With the equipment of this Hartigpatent, such gaps would expose the electrode to unwanted coating. Thiswould make it necessary to clean the electrode periodically, thusdefeating the goal of having a continuous coating process.

Further, this solution is not well suited for coating non-conductivesubstrates on commercial “in-line” coaters. The Hartig patent teachesuse of a high frequency (HF) power supply to establish current flowthrough non-conductive substrates. Unfortunately, HF cathodes are onlyavailable in sizes that allow coating a width of up to about 48″,whereas large area substrates (e.g., glass for architectural orautomotive applications) commonly exceed this width. Moreover, it isextremely difficult to match the output impedance of an HF power supplyto the constantly changing impedance of a plasma. The mismatching ofimpedance creates arcing, which can be damaging to the substrate andchamber. Further, it is difficult to achieve uniform distribution of HFpower along the cathode when impedance mismatching occurs. This cancause non-uniformity among different areas of the coating. Thus, itwould not be practical to deposit coatings on non-conductive large areasubstrates using high frequency power supplies.

The Hartig patent also indicates that direct current (DC) cathodes canbe used. Insofar as non-conductive substrates are concerned, a DCcathode would create a negative electric field on a non-conductivesubstrate. This negative electric field would make it extremelydifficult to maintain stable plasma, which is necessary for uniform filmdeposition. Therefore, a DC power supply would not be desirable forcoating non-conductive substrates using the equipment of the Hartigpatent.

It would be desirable to provide methods and equipment for continuouslycoating substrates without the problems discussed above.

SUMMARY OF THE INVENTION

In certain embodiments, the present invention provides an apparatus fordepositing films onto substrates. The apparatus comprises a depositionchamber having a substrate-coating region (e.g., wherein a substratespaced apart from the electrode 28 is coated by plasma-enhanced chemicalvapor deposition) and an electrode-cleaning region (e.g., wherein anouter surface of the electrode 28 is cleaned of contamination bysputtering). The electrode has an interior cavity with first and secondmagnet systems within the deposition chamber.

Certain aspects of the invention provide an electrode assembly for afilm-deposition apparatus, which comprises a rotatable electrode(optionally having an outer coating of low sputter rate material, suchas carbon) having an interior cavity and stationary first and secondgenerally-opposed magnet systems disposed within the interior cavity(optionally a first magnet system oriented in one direction and a secondmagnet system oriented in another direction, wherein the first magnetsystem is adapted to create a more narrow plasma confinement than thesecond magnet system).

Certain embodiments of the invention provide an apparatus for depositingfilms onto substrates, which comprises a deposition chamber having asubstrate-coating region in which a first gaseous atmosphere can beestablished and an electrode-cleaning region in which a second gaseousatmosphere can be established. A rotatable electrode is positioned inthe deposition chamber and has an interior cavity wherein stationaryfirst and second magnet systems are disposed. The first magnet system isadapted to create a first plasma confinement in the first gaseousatmosphere and the second magnet system is adapted to create a secondplasma confinement in the second gaseous atmosphere.

Certain aspects of the invention provide a method for depositing filmsonto substrates, which comprises providing a film-deposition apparatuscomprising a deposition chamber having a substrate-coating region and anelectrode-cleaning region. An electrode having an interior cavity andfirst and second magnet systems is positioned in the deposition chamber.A first gaseous atmosphere comprising a precursor gas is established inthe substrate-coating region. A second gaseous atmosphere comprising asputtering gas is established in the electrode-cleaning region. Acathodic charge is delivered to the electrode, thereby creating plasmain the first gaseous atmosphere that is held by the first magnet systemin a first plasma confinement. Plasma is also created in the secondgaseous atmosphere that is held by the second magnet system in a secondplasma confinement. The precursor gas is chemically reacted and/ordecomposed in the first plasma confinement. A substrate is positioned inthe substrate-coating region exposing the substrate to thechemically-reacting and/or decomposing precursor gas such that coatingis formed on the substrate.

In certain embodiments, the invention provides a film-depositionapparatus. The apparatus comprises a deposition chamber having asubstrate-coating region and an electrode-cleaning region, wherein afirst gaseous atmosphere can be established in the substrate-coatingregion while a second gaseous atmosphere (preferably having a differentcomposition than the first atmosphere) can be established in theelectrode-cleaning region. A rotatable electrode is positioned in thedeposition chamber and has an interior cavity. First and second magnetsystems are disposed in said interior cavity. In some cases, a substratein the substrate-coating region has a first major surface oriented awayfrom the rotatable electrode, and operation of the film-depositionapparatus coats the first major surface of the substrate. In some suchcases, the substrate is a glass sheet. Preferably, the rotatableelectrode has an outer surface that is sputtered clean of unwantedcontamination (e.g., is sputtered substantially clean of any coating onthe outer surface of the electrode) in the electrode-cleaning region. Incertain embodiments, the electrode-cleaning region, in which theelectrode is sputtered clean, does not contain any substrate or anysubstrate support. In these embodiments, the region 16 of the chamber inwhich sputtering occurs does not contain a substrate to be coated.Rather, the substrate to be coated in these embodiments is in a region14 of the chamber wherein preferably no sputtering occurs. In somecases, the first magnet system is oriented toward the substrate-coatingregion and the second magnet system is oriented toward theelectrode-cleaning region. In some embodiments, the substrate-coatingregion contains the first gaseous atmosphere and the electrode-cleaningregion contains the second gaseous atmosphere. In certain embodiments ofthis nature, the electrode is exposed to both the first and secondgaseous atmospheres. In some aspects of the invention, the first magnetsystem in adapted to create a first plasma confinement in the firstgaseous atmosphere and the second magnet system is adapted to create asecond plasma confinement in the second gaseous atmosphere. Preferably,the first gaseous atmosphere comprises a precursor gas and the secondgaseous atmosphere comprises a sputtering gas. The sputtering gascommonly is inert gas. The precursor gas preferably is chemicallyreacted and/or decomposed in the first plasma confinement such thatcoating is formed on a substrate that is exposed to thechemically-reacting and/or decomposing precursor gas in the first plasmaconfinement. For example, the substrate can have a first major surfaceoriented away from the rotatable electrode, such that the first majorsurface receives the coating. Optionally, the substrate has a secondmajor surface oriented toward the rotatable electrode and this secondmajor surface remains substantially uncoated during the exposure of thesubstrate in the first plasma confinement. In certain embodiments, thesputtering gas is converted to plasma in the second plasma confinementand bombards an outer surface of the electrode, thereby cleaningunwanted contamination from the outer surface of the electrode. In someaspects of the invention, the rotatable electrode is cylindrical and isrotatable about its longitudinal axis. In certain embodiments, the firstand second magnet systems are stationary. Further, in certainembodiments, the first and second magnet systems are disposed in agenerally-opposed configuration. The first and second magnet systems canoptionally each comprise an elongated magnetic array. Preferably, thesubstrate support is positioned in the substrate-coating region of thedeposition chamber. In some embodiments, the substrate support isadapted to convey a series of spaced-apart sheet-like substrates. Insome cases, the substrate-coating region of the chamber is at a higherelevation than the electrode-cleaning region of the chamber, and thesubstrate support is adapted to retain a substrate above the rotatableelectrode. In some such cases, the substrate support comprises a seriesof spaced-apart transport rollers adapted to convey substrates over therotatable electrode. Preferably, the substrate support defines a path ofsubstrate travel a desired portion of which is adjacent the electrode.Further, the first magnet system is desirably adapted to create a firstplasma confinement about the desired portion of the path of substratetravel. In some cases, the first magnet system is adapted to create afirst plasma confinement defining a magnetic trap that closes over asurface of a substrate on the desired portion of the path of substratetravel. For example, the first gaseous atmosphere can optionallycomprise a precursor gas that is chemically reacted and/or decomposed inthe first plasma confinement such that a substrate on the desiredportion of the path of substrate travel is exposed to thechemically-reacting and/or decomposing precursor gas and is therebycoated. For example, the substrate can optionally have a first majorsurface that is oriented away from the rotatable electrode, such thatthe first major surface of the substrate is coated. Further, in somecases, the substrate has a second major surface that is oriented towardthe rotatable electrode, and the second major surface remainssubstantially uncoated during the exposure of the substrate in the firstplasma confinement. The rotatable electrode can optionally have an outerlayer of low sputter rate material (e.g., carbon or carbon-basedmaterial). For example, the electrode can comprise a backing tube onwhich the outer layer of low sputter rate material is carried. In somecases, the apparatus further comprising a gas delivery system adaptedfor delivering a precursor gas to the substrate-coating region and asputtering gas to the electrode-cleaning region. In some embodiments, afirst vacuum pump is operably connected to the substrate-coating regionand a second vacuum pump is operably connected to the electrode-cleaningregion. The deposition chamber is preferably adapted for separate gasdelivery and vacuum pumping of the substrate-coating region and theelectrode-cleaning region. In some embodiments, the deposition chamberincludes a divider between the substrate-coating region and theelectrode-cleaning region. When provided, the divider can optionallycomprise two spaced-apart walls bounding an intermediate atmosphere.Further, the apparatus can optionally comprise a vacuum pump incommunication with the intermediate atmosphere.

In certain embodiments, the invention provides a method for depositingfilms onto substrates. The method comprises: a) providing afilm-deposition apparatus comprising a deposition chamber having asubstrate-coating region and an electrode-cleaning region, a rotatableelectrode positioned in the deposition chamber and having an interiorcavity, and first and second magnet systems disposed in said interiorcavity; b) establishing in the substrate-coating region a first gaseousatmosphere comprising a precursor gas; c) establishing in theelectrode-cleaning region a second gaseous atmosphere comprising asputtering gas; d) delivering a charge to the electrode, therebycreating in the first gaseous atmosphere plasma that is held by thefirst magnet system in a first plasma confinement and creating in thesecond gaseous atmosphere plasma that is held by the second magnetsystem in a second plasma confinement, the precursor gas beingchemically reacted and/or decomposed in the first plasma confinement;and e) positioning a substrate in the substrate-coating region andexposing the substrate to the chemically-reacting and/or decomposingprecursor gas in the first plasma confinement such that coating isformed on the substrate. In some cases, the substrate is positioned inthe substrate-coating region and has a first major surface oriented awayfrom the rotatable electrode, and the coating is formed on the firstmajor surface of the substrate. Optionally, the substrate has a secondmajor surface that is oriented toward the rotatable electrode and thatremains substantially uncoated during the exposure of the substrate inthe first plasma confinement. In certain embodiments, the methodcomprises conveying a series of spaced-apart substrates through thesubstrate-coating region and exposing the substrates to thechemically-reacting and/or decomposing precursor gas such that coatingsare formed on the substrates. In some embodiments, the electrode isexposed to the second gaseous atmosphere such that plasma in the secondplasma confinement bombards an outer surface of the electrode, therebycleaning unwanted contamination from the outer surface of the electrode.Optionally, the electrode is rotated continuously during filmdeposition, and unwanted contamination is cleaned continuously from theouter surface of the electrode. In certain embodiments, the electrode iscylindrical and is rotated about its longitudinal axis. In some cases,the substrate is positioned in the substrate-coating region and exposedto the chemically-reacting and/or decomposing precursor gas by conveyingthe substrate along a substrate support that defines a path of substratetravel a desired portion of which is adjacent the electrode and is inthe first plasma confinement. In some such cases, the substrate is aglass sheet, the substrate support comprises a series of spaced-aparttransport rollers, and the glass sheet is conveyed over the rollers.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional side illustration of an apparatus fordepositing films onto substrates in accordance with certain embodimentsof the present invention;

FIG. 2 is a schematic perspective illustration of an electrode assemblyfor a film-deposition apparatus in accordance with certain embodimentsof the invention;

FIG. 3 is a schematic perspective illustration of an electrode assemblyfor a film-deposition apparatus in accordance with certain embodimentsof the invention;

FIG. 4A is a perspective illustration of a cylindrical sputteringtarget;

FIG. 4B is a cross-sectional illustration of the cylindrical sputteringtarget of FIG. 4A;

FIG. 5A is a perspective illustration of an electrode assembly inaccordance with certain embodiments of the invention;

FIG. 5B is a cross-sectional illustration of the electrode assembly ofFIG. 5A;

FIG. 6 is a cross-sectional illustration of an electrode assembly inaccordance with certain embodiments of the invention;

FIG. 7A is a cross-sectional illustration of an electrode assembly inaccordance with certain embodiments of the invention;

FIG. 7B is a cross-sectional illustration of an electrode assembly inaccordance with certain embodiments of the invention;

FIG. 7C is a cross-sectional illustration of an electrode assembly inaccordance with certain embodiments of the invention; and

FIG. 8 is a cross-sectional side illustration of an apparatus fordepositing films onto substrates in accordance with certain embodimentsof the invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

The following detailed description is to be read with reference to thedrawings, in which like elements in different drawings have been givenlike reference numerals. The drawings, which are not necessarily toscale, depict selected embodiments and are not intended to limit thescope of the invention. Skilled artisans will recognize that theexamples given have many useful alternatives that fall within the scopeof the invention.

FIG. 1 is a cross-sectional side illustration of an apparatus fordepositing films onto substrates in accordance with certain embodimentsof the present invention. This apparatus generally includes a depositionchamber 12 and an electrode 28. The deposition chamber 12 preferably hasa substrate-coating region 14 and an electrode-cleaning region 16.During use, film deposition occurs (e.g., on a substrate adjacent theelectrode 28) in the substrate-coating region 14, while unwantedcontamination can be cleaned from the electrode 28 in theelectrode-cleaning region 16. The electrode 28 is positioned in thedeposition chamber 12, for example, between the substrate-coating region14 and the electrode-cleaning region 16. In some cases, thesubstrate-coating region 14 is at a higher elevation than (i.e., islocated above) the electrode-cleaning region 16. Preferably, theelectrode 28 has an interior cavity 27 in which first 34 and second 32magnet systems are disposed. The first 34 and second 32 magnet systemsare adapted respectively to create first 60 and second 66 plasmaconfinements in the deposition chamber 12.

Thus, the deposition chamber 12 preferably has both a substrate-coatingregion 14 in which film deposition can be performed (e.g., in which filmis deposited by plasma-enhanced vapor deposition upon a substrateconveyed through this region 14) and an electrode-cleaning region 16 inwhich unwanted contamination can be cleaned from the electrode 28 (e.g.,in which unwanted contamination is sputtered off an outer surface of theelectrode 28). During use, the substrate-coating region 14 preferablycontains a first gaseous atmosphere and the electrode-cleaning region 16preferably contains a second gaseous atmosphere. These gaseousatmospheres preferably have different compositions. For example, incertain embodiments the electrode-cleaning region 16 contains an inert(or substantially inert) atmosphere while the substrate-coating region14 contains a reactive atmosphere. With respect to the substrate-coatingregion 14, this region 14 preferably contains a gaseous atmospherecomprising a precursor gas, as described below. With respect to theelectrode-cleaning region 16, this region 16 preferably contains agaseous atmosphere comprising a sputtering gas. In particular, thisatmosphere (i.e., the second gaseous atmosphere) preferably comprises aninert sputtering gas, such as argon or another noble gas. The term“sputtering gas” is used herein to refer to any gas (inert or reactive)that provides a suitable medium for establishing and stably maintaininga plasma (e.g., a glow discharge). Argon is a preferred sputtering gasgiven its high atomic mass and high sputtering yield. However, skilledartisans will recognize that a variety of other sputtering gases can beused.

Thus, it can be appreciated that certain embodiments provide adeposition chamber in which first and second gaseous atmospheres can beestablished. Preferably, these gaseous atmospheres are substantiallyisolated from each other (e.g., by differential pumping). In someembodiments, the electrode 28 is exposed during use to both the firstand second gaseous atmospheres. The first 34 and second 32 magnetsystems within the interior 27 of the electrode 28 are preferablyadapted respectively to create a first plasma confinement 60 in thefirst gaseous atmosphere and a second plasma confinement 66 in thesecond gaseous atmosphere. Thus, the first magnet system 34 ispreferably oriented toward the substrate-coating region 14, and thesecond magnet system 32 is preferably oriented toward theelectrode-cleaning region 16. This results in the first plasmaconfinement 60 being located in the substrate-coating region 14 (e.g.,adjacent to, and enveloping, a desired portion of a path of substratetravel, which is preferably spaced a short distance from the electrode28), and the second plasma confinement 66 being located in theelectrode-cleaning region 16 (e.g., adjacent the electrode 28).

With regard to the substrate-coating region 14 of the chamber 12, theaction of the plasma in the first confinement 60 causes precursor gas inthe first gaseous atmosphere to undergo a chemical reaction and/ordecomposition that facilitates film deposition. When a substrate 36(e.g., a glass sheet) is exposed to the chemically-reacting and/ordecomposing precursor gas in the first plasma confinement 60, coating isformed on the substrate 36. This coating condenses from the gas phaseand coats a desired surface 62 of the substrate 36 (i.e., the surface 62over which the first plasma confinement 60 is closed), which surface 62is exposed to the first plasma confinement 60 and thus to thechemically-reacting and/or decomposing precursor gas in the first plasmaconfinement 60. Preferably, the substrate has a first major surface 62that is oriented (i.e., faces) away from the electrode 28 and that iscoated during its exposure to he chemically-reacting and/or decomposingprecursor gas in the first plasma confinement 60. Thus, the inventionprovides continuous film deposition from the gas phase. This filmdeposition can be performed on an uninterrupted basis, since productionstops for cleaning and target change-outs are avoided. As a result, theinvention provides an outstanding boost in productivity.

As noted above, the first gaseous atmosphere desirably comprises aprecursor gas (e.g., diluted silane). Preferably, the precursor gascomprises material that condenses (by a chemical reaction and/or adecomposition) upon the substrate during film deposition. A wide varietyof precursor gases can be used. For example, a variety of inorganicfilms can be formed on the substrate from gaseous or volatile compounds,such as of silicon, germanium, arsenic, boron, aluminum, titanium,phosphorous, gallium, etc. Further, a variety of polymeric films can beformed on the substrate from polymerizable monomers, such as methylmethacrylate (to form polymethylmethacrylate). Metal-containing filmscan be formed on the substrate from organometallics. Silicon-containingfilms can be formed on the substrate from silanes,tetraethylorthosilicate (TEOS), tetramethyl orthosilicate (TMOS),octamethylcyclotetrasiloxance (OMCTS), or tetramethylcyclotetrasiloxane(TMCTS). Carbon-containing films can be formed on the substrate fromhydrocarbon compounds, such as C₂H₂ or C₄H₁₀. Skilled artisans willrecognize that a variety of precursor gases can be provided in thecoating region 14 to form on the substrate 36 various types of films.

In one particular method wherein silica is deposited, the coating region14 is provided with silane (SiH₄) and oxygen (O₂), optionally along withnitrogen (N₂) and/or an inert gas, such as argon (Ar) or helium (He). Inanother particular method wherein silica is deposited, the coatingregion 14 is provided with tetraethylorthosilicate (TEOS) and oxygen,optionally along with an inert gas. In one particular method whereinsilicon nitride (Si₃N₄) is deposited, the coating region 14 is providedwith a silane-based gas, such as silane or dichlorosilane (SiH₂Cl₂),along with a nitrogen-containing gas, such as nitrogen (N₂) or ammonia(NH₃), optionally together with an inert gas. In one particular methodwherein silicon is deposited, the coating region 14 is provided withsilane and an inert gas. In one particular method wherein titaniumnitride is deposited, the coating region 14 is provided with titaniumtetrachloride gas and a nitrogen-containing gas, such as nitrogen orammonia, optionally together with an inert gas. In one particular methodwherein aluminum nitride is deposited, the coating region 14 is providedwith methylaluminum (Al(CH₃)₃) gas along with an inert gas. In oneparticular method wherein polymethylmethacrylate is deposited, thecoating region 14 is provided with methyl methacrylate (C₅H₈O₂) alongwith a nitrogen-containing gas, such as nitrogen or ammonia, optionallytogether with an inert gas.

A particularly advantageous aspect of the invention is that condensationof the precursor gas occurs only in the immediate vicinity of the firstplasma confinement 60 (i.e., in the substrate-coating region 14 adjacentthe first magnet system 34/adjacent the desired portion of the path ofsubstrate travel). The spatial extent of the plasma in thesubstrate-coating region 14 is preferably limited to the area of thefirst plasma confinement 60. Therefore, the conditions required for filmdeposition (e.g., the action of plasma upon precursor gas) preferablyonly exist in the area of the first plasma confinement 60. Accordingly,film deposition is preferably restricted to this immediate area. As aresult, coating preferably does not form on interior surfaces of thedeposition chamber 12 remote from the electrode 28. Thus, it can beappreciated that the invention can obviate problems associated with thegrowth of a contamination layer (spalling, flaking, or peeling of thecontamination layer, vanishing/poisoned anode, etc.). Moreover, sincecoating preferably occurs only in the area of the first plasmaconfinement 60, there can be achieved a high degree of utilization ofthe precursor gas/coating material. Since the precursor gas and theresulting coating material can be quite expensive, this is highlydesirable. Further, the invention achieves films that are ofparticularly high quality. Since coating occurs only in the area of thefirst plasma confinement 60, there is little likelihood of the filmbeing deposited at acute angles (which is preferably avoided). Thus, thefilm grows in a very homogenous manner.

During operation, a certain amount of film may condense upon theelectrode 28. For example, the apparatus can be used to coat a plurality(e.g., a series) of spaced-apart substrates (e.g., glass sheets),wherein gaps 41 between adjacent substrates are maintained duringcoating (e.g., during conveyance of the spaced-apart substrates throughthe chamber). When these gaps 41 are aligned with the electrode 28 (asoccurs repeatedly when spaced-apart substrates 36 are conveyed past theelectrode 28), the gaps 41 expose the electrode 28 to thechemically-reacting and/or decomposing precursor gas in the first plasmaconfinement 60. Thus, it can be appreciated that a certain amount ofcontamination may form on the electrode 28 during the coating process.This contamination, however, can be readily removed (entirely or to adesired extent) by operation of the electrode-cleaning region 16.

The electrode 28 has an advantageous cylindrical configuration incertain preferred embodiments. In these embodiments, any unwantedcoating that builds-up on the electrode 28 is spread over the largecylindrical outer surface of the electrode 28. Thus, any coating thatbuilds-up on the electrode 28 does so relatively slowly, given its largeexterior surface area. Moreover, the unique design and method ofoperating the present apparatus facilitates removal of unwantedcontamination on the electrode 28 by the action of plasma in the secondplasma confinement 66, as will now be described.

The action of the plasma in the second confinement 66 has a cleaningeffect on the electrode 28. In FIG. 1, it can be appreciated that theillustrated electrode 28 is exposed to the gaseous atmosphere in theelectrode-cleaning region 16 of the chamber 12. As noted above, thesecond magnet system 32 localizes the second plasma confinement 66 inregion 16 adjacent the electrode 28. Thus, the electrode 28 is exposedto the plasma in the second confinement 66. In some embodiments,positively-charged particles (e.g., ions) in this plasma are attractedto the negatively-charged electrode 28 and bombard its outer surface 123(these relative charges can be reversed, switched, etc., if so desired).This has the effect of sputtering away unwanted coating that hascondensed upon the outer surface 123 of the electrode 28. Thus, it canbe appreciated that the plasma in the second confinement 66 cleans(i.e., removes) unwanted contamination from the electrode 28, therebyallowing the apparatus to be operated continuously without having tostop and manually remove coating from the electrode 28.

A further aspect of the invention involves selecting and utilizing anelectrode cleaning rate (i.e., the rate at which coating is sputteredoff the electrode) that removes unwanted coating from the electrodewithout significantly sputtering away the material of the electrode.This can be done by determining the rate at which unwanted coatingbuilds-up on the electrode 28 during a given film deposition process(i.e., the electrode-coating rate) and selecting cleaning processparameters that yield a substantially equal electrode-cleaning rate(i.e., the rate at which the coating material in question is sputteredoff the electrode). By operating the apparatus continuously at theseparameters (e.g., by continuously performing both film deposition andelectrode cleaning), the electrode 28 can be kept substantially free ofundue coating build-up, while preventing the material of the electrode28 itself from being sputtered away. In some cases, it may be preferableto allow a small thickness of coating to remain on the electrode toassure that the material of the electrode 28 is not sputtered away.

The electrode-cleaning process is not required to be performedcontinuously at all times during the substrate-coating process. Rather,in certain alternate embodiments, the electrode-cleaning process isperformed periodically while the substrate-coating process is performedcontinuously. For example, each time the cleaning process is performed,it may be continued only until all of the coating is removed from theelectrode, or until only a desired thickness of coating remains on theelectrode 28. Thereafter, the cleaning process can be stopped orsubstantially stopped (e.g., by evacuating the electrode-cleaning region16) until such time as another period of cleaning is desired. In thesealternate embodiments, the substrate-coating process can advantageouslybe performed continuously even when the electrode-cleaning process isstopped. For example, the electrode-cleaning process can be performedfor a desired period of time, which period of time is determined (e.g.,has been predetermined) for a given process to bring about a desiredamount of removal from the electrode (e.g., complete removal or removalof all but a desired thickness) of the coating material in question.

Certain embodiments of the invention provide an electrode assembly 26.The electrode assembly 26 in these embodiments generally includes anelectrode 28 and two magnet systems 32, 34. With reference to FIGS. 5-8,it can be appreciated that the electrode 28 preferably has (i.e.,bounds) an interior cavity 27 in which the first 34 and second 32 magnetsystems are disposed. Preferably, the electrode 28 is rotatable whilethe first 34 and second 32 magnet systems are stationary.

The preferred electrode 28 has a cylindrical or tubular configurationand is formed of an electrically-conductive material, such as stainlesssteel, aluminum, copper, titanium, or any other suitably conductivematerial. With continued reference to FIGS. 5-8, it can be appreciatedthat the preferred electrode 28 comprises a cylindrical or tubular wall122. For example, the electrode 28 can comprise an elongated tube ofelectrically-conductive material. In some cases, the electrode comprisesa conventional backing tube for a cylindrical sputtering target. In suchcases, the backing tube does not have (i.e., is provided without) theouter layer of sputterable target material. Rather, the outer surface123 of the electrode 28 is defined by the backing tube 122 itself, or bya layer 177 of low sputter rate material (described below), as isprovided in certain embodiments. While a cylindrical electrode 28 isdepicted in the drawings, various other configurations can be used forthe electrode 28.

As is perhaps best appreciated with reference to FIGS. 5B and 6, thefirst 34 and second 32 magnet systems are disposed in agenerally-opposed configuration in certain preferred embodiments. Forexample, the first magnet system 34 can be upwardly oriented while thesecond magnet system 32 is downwardly oriented. However, this is by nomeans a requirement. Preferably, the first magnet system 34 is orientedtoward the substrate-coating region 14 and the second magnet system 32is oriented toward the electrode-cleaning region 16. These two regions14, 16 are on opposite sides of the electrode 28 (e.g., respectivelyabove and below the electrode) in the illustrated chamber 12. Thus, thefirst 34 and second 32 magnet systems in this chamber 12 are generallyopposed. However, the deposition chamber 12 can alternatively beconfigured such that the first 34 and second 32 magnet systems are notgenerally-opposed when facing the coating region 14 and the cleaningregion 16, respectively.

Referring now to FIGS. 1 and 5-8, each of the magnet systems 32, 34 canbe any suitable type of magnet or magnet assembly. Preferably, eachmagnet system is adapted to create a closed magnetic trap. For example,each of the magnet systems 32, 34 can be set up in a so-called “2-to-1scheme”. Thus, if there are two north poles in each magnet system, thenthere is preferably one south pole located between the two north poles.Likewise, if there are two south poles in each magnet system, then thereis preferably one north pole located between the two south poles. Insome cases, each magnet system comprises an elongated magnetic array.For example, each magnet system can comprise an array of magnetic polesarranged in rows extending substantially the entire length of theelectrode 28. In more detail, all of the poles in a given row can havethe same polarity, and the rows can have alternating polarity. Forexample, there can be three rows having respective north-south-northpolarities or respective south-north-south polarities. If so desired,each magnet system 32, 34 can comprise a conventional magnet assemblyfor cylindrical magnetron sputtering, provided that one of the magnetsystems 34 is oriented (e.g., upwardly) toward the coating region 14,while the other 32 is oriented (e.g., downwardly) toward the cleaningregion 16.

With reference to FIG. 1, it can be appreciated that each magnet systemcreates lines of magnetic flux 61 in the deposition chamber 12.Preferably, the first magnet system 34 creates lines of flux 61 whichextend into the substrate-coating region 14, and the second magnetsystem 32 creates lines of flux 61 which extend into theelectrode-cleaning region 16. The lines 61 of flux from each magnetsystem preferably extend from pole to pole.

The lines 61 of flux from the first magnet system 34 preferably extendfrom inside the electrode 28, through the wall 122 of the electrode 28,and through a substrate 36 (during film deposition), closing over thesubstrate surface 62 that is to be coated (which preferably is orientedaway from the electrode 28). Thus, the first magnet system 34 preferablycreates a closed magnetic trap (which preferably closes of surface 62)which limits the spatial extent of the first plasma confinement 60. Asnoted above, the conditions required for film deposition (e.g., theaction of plasma on a precursor gas) are thus localized adjacent theelectrode 28 and about a desired portion of the path of substrate travel(which is defined by the substrate supports 38).

In certain embodiments, the first magnet system 34 is of sufficientstrength to emit magnetic flux lines 61 a predetermined distance abovethe surface 62 of a desired substrate 36 (e.g., a glass sheet)positioned on the substrate supports 38. In certain embodiments, thefirst magnet system 34 is of sufficient strength to emit flux lines 61at least about ¾ inch, more preferably at least about 1 inch, andperhaps optimally at last about 2 inches above the surface 62 of thesubstrate 36.

The lines 61 of flux from the second magnet system 32 preferably extendfrom inside the electrode 28, through the wall 122 of the electrode 28,and into the electrode-cleaning region 16, closing over the outersurface 123 of the electrode 28. Thus, the second magnet system 32preferably creates a closed magnetic trap which limits the spatialextent of the second plasma confinement 66. Since the outer surface 123of the electrode 28 is preferably exposed to the plasma discharge of thesecond plasma confinement 66, any unwanted coating on the outer surface123 of the electrode 28 can be removed (i.e., sputtered away) by ionbombardment from the plasma in the second plasma confinement 66. Incertain embodiments, the second gaseous atmosphere (i.e., the gaseousatmosphere in the electrode-cleaning region 16) is substantially free ofgas that decomposes and/or chemically reacts (so as to form a coating onsurfaces) in the second plasma confinement 66. For example, the secondgaseous atmosphere may consist essentially of inert gas.

It can be appreciated that certain embodiments provide an upper magnetsystem 34 (e.g., oriented upwardly toward a substrate position) and alower magnet system 32 (e.g., oriented downwardly away from a substrateposition). In some cases, the upper magnet system 34 is more narrow thanthe lower magnet system 32. That is, the upper magnet system 34 may beadapted to create a more narrow magnet trap than the lower magnet system32. This would result in the first plasma confinement 66 having anarrower width (e.g., in the left-to-right dimension, as seen in FIG. 1)than the second plasma confinement 60. The relative widths of the first34 and second 32 magnet systems can be adjusted to achieve a desiredbalance of coating and cleaning rates. Particularly good film qualitymay be achieved using a narrow magnet system 34.

The magnet systems 32, 34 can be mounted within the interior 27 of theelectrode 28 in a variety of ways. Each magnet system (and the polefaces thereof) preferably lies as close as possible to the inner surface121 of the electrode 28. FIGS. 5B and 6 depict one suitable manner ofmounting the magnet systems 32, 34. The illustrated magnet systems 32,34 are carried by a stationary, elongated support member 33 that extendsaxially through the electrode's interior cavity 27. In FIGS. 5B and 6,each magnet system is mounted to the support member 33 by brackets 31.Various other means can be used for mounting the magnet systems 32, 34on a support member 33 of this nature.

The magnet systems 32, 34 can be mounted in the interior 27 of theelectrode 28 using one or more of the mounting systems shown in FIGS.7A, 7B, and 7C. Since the magnet systems 32, 34 extend alongsubstantially the entire length of the electrode 28, each magnet systemcan be attached to the support member 33 at periodic locations along itslength. With reference to FIG. 7A, a magnet system 32 is attached to thesupport member 33 by a bracket comprising a rigid plate 39 and a strap37. In FIG. 7A, the illustrated second magnet system 32 is orienteddownwardly and has a south-north-south polarity arrangement. Withreference to FIG. 7B, the same general type of mounting system is shownfor the first magnet system 34. In FIG. 7B, the illustrated first magnetsystem 34 is oriented upwardly with its polarity in a south-north-southarrangement. In the embodiments of FIGS. 7A and 7B, a north-south-northpolarity arrangement can alternatively be used.

It may be preferable (particularly for lengthy electrodes 28) to provideone or more roller supports for the second magnet system 32. FIG. 7Cdepicts a roller support comprising two brackets 95 that extendrespectively from opposed lateral sides of the magnet system 32. Aroller 97 is mounted (e.g., journaled) at the end of each bracket 95.The rollers 97 are adapted to ride on the electrode's interior surface121 during rotation of the electrode 28.

Thus, there are preferably two magnet assemblies in the interior of theelectrode. This, however, is not strictly required. For example, asingle magnet assembly can be provided in alternate embodiments. Forexample, it is suitable to provide first and second magnet systemsembodiment in the form of a single magnet assembly adapted to form afirst plasma confinement 66 in the substrate-coating region 14 and asecond plasma confinement 60 in the electrode-cleaning region 16.Skilled artisans may wish to utilize various designs of this nature.

In certain embodiments, a coolant (e.g., water) is circulated within theelectrode. The temperature of the electrode 28 tends to increase duringoperation. Thus, it is desirable to cool the electrode 28 (e.g., withwater or another cooling fluid) to maintain a desirable electrodetemperature. Tubing (e.g., extending from a supply of liquid coolant)can be provided within the interior 27 of the electrode 28. It may bedesirable to form such tubing of electrically-nonconductive material. Inthe embodiments of FIGS. 5-7, the support member 33 itself can carry acooling fluid (e.g., water can be circulated through the interior cavity35 of the support member 33). Cooling lines can be mounted against themagnet systems 32, 34, if so desired. For example, the mounting systemof FIG. 6 can comprise cooling lines (not shown) between the brackets 31and the magnet systems, e.g., at regions 37.

As noted above, the electrode 28 can optionally be provided with anouter layer 177 of low sputter rate material. For example, the electrode28 can comprise a backing tube 122 on which the outer layer 177 of lowsputter rate material is carried. In some cases, the electrode is simplyprovided with a thin outer coating of low sputter rate material.Reference is made to FIG. 6, wherein the electrode 28 has an outer layer177 of low sputter rate material. In embodiments of this nature, theouter surface 123 of the electrode 28 is defined by the low sputter ratematerial 177. The optional outer layer 177 of low sputter rate materialcan be provided to ensure the electrode 28 itself is not sputtered awayexcessively during the electrode-cleaning process. Any low sputter ratematerial can be used. Carbon is a preferred low sputter rate material.Thus, the outer layer 177 comprises carbon in certain preferredembodiments. Skilled artisans may wish to utilize other low sputter ratematerials. In alternate embodiments, the electrode 28 itself (e.g., thebacking tube 122) is formed of a low sputter rate material.

Preferably, the electrode 28 is positioned in the chamber 12 and is heldin place by a first support assembly 90 and an optional second supportassembly 90. Alternatively, the electrode 28 can be held in place by asingle cantilever support (not shown) at one end of the electrode 28.Skilled artisans will appreciate that various means can be used formounting the electrode 28 in the deposition chamber 12.

Thus, the electrode 28 is disposed within (or partially within) thechamber 12. Preferably, the electrode 28 is mounted rotatably in thechamber 12. For example, the electrode 28 can be mounted for rotationabout its longitudinal axis 72. This can be accomplished by rotatablymounting the electrode 28 in the same well known manner (e.g., usingknown end blocks) that cylindrical sputtering targets are mountedrotatably in sputtering chambers. Skilled artisans will be familiar withsuch mounting systems.

It can thus be appreciated that the electrode assembly 26 preferablyincludes means for rotating the electrode 28. For example, the electrodeassembly 26 can comprise a motor assembly 30 connected to the electrode28, such as by bracket or housing structures 90 that function as supportassemblies. This is perhaps best appreciated with reference to FIG. 2.The support assemblies 90 (which can be conventional end blocks forcylindrical sputtering targets) can comprise a motor assembly(preferably adapted to maintain continuous rotation of the electrode 28)to which the electrode 28 can be operably adjoined. As is perhaps bestappreciated with reference to FIG. 3, the motor assembly preferablycomprises a motor source 76, a power supply 78, and a control system 80.The motor assembly 30 may be configured and/or programmed to optimizeefficient use of the electrode 28. For example, the motor assembly 30may be programmed configured and/or to produce a predeterminedrotational speed which achieves a desired balance of the coating andcleaning rates. Further, the motor assembly 30 may be adapted (e.g.,configured and/or programmed) to produce changes in the rotational speedof the electrode 28, as may be desirable to optimize the cleaningprocess and the life of the electrode 28. One or more power supplies canbe used to provide power to the motor source 76, the conductors/anodes56, and the electrode 28.

With reference to the embodiment of FIG. 2, it can be appreciated thatat least one of the support assemblies 90 preferably comprises (or isoperably connected to) a motor 74 for rotating the electrode 28. Themotor 74 can be an electric motor, a programmable stepper motor, etc. InFIG. 2, the electrode 28 is mounted on the support assemblies 90 suchthat the motor 74 is adapted to rotate the electrode 28 about itslongitudinal axis 72. Support assemblies 90 (or “end blocks”) with sucha motor 74 are well known in the present art (e.g., conventional endblocks for a cylindrical sputtering target are suitable for rotatablymounting the present electrode 28).

In the particular embodiment of FIG. 3, the motor assembly 30 comprisesa motor source 76 (which is operable in conjunction with a power source78 and a control system 80) that includes one or more pulleys 82 and oneor more toothed belts 84. The pulleys 82 and belts 84 are operablyconnected to the electrode assembly 26 so that when the motor source 76is activated it moves the electrode 28 in a rotational motion (i.e., itrotates the electrode 28 about its longitudinal axis 72).

In another particular embodiment (not shown), the electrode assembly 26includes a shaft extending longitudinally from the electrode 28,supported on pivot bearings, and connected over a sliding contact with avoltage source. The shaft is connected to a drive motor, the speed ofwhich can be controlled by a drive control. Many other systems can beused for rotatably mounting the electrode 28.

A single electrode assembly 26 is illustrated in the deposition chamber12. However, two or more electrode assemblies 26 can be provided in asingle chamber 12, if so desired. Embodiments of this nature areexpected to be of particular advantage. Thus, certain embodiments of theinvention provide a deposition chamber wherein there are provided atleast two electrode assemblies 26 of the described nature.

In certain preferred embodiments, the deposition chamber 12 is providedwith a divider between the substrate-coating region 14 and theelectrode-cleaning region 16. This divider separates the coating 14 andcleaning 16 regions of the chamber 12, preferably such that differentgaseous atmospheres can be maintained in these regions. Preferably, thecoating 14 and cleaning 16 regions of the chamber 12 are each connectedto a separate vacuum pump and a separate gas delivery line, andmonitored separately for pressurization (i.e., for total and partialpressures), such that each region 14, 16 of the chamber 12 is anindependently controlled environment.

The divider can be provided in a variety of different forms. Forexample, the divider can take the form of a single wall. One embodimentof this nature is shown in FIG. 1, wherein the illustrated single-walldivider comprises partitions (or “partial dividers”) 18, 20 that isolatethe respective atmospheres of the coating 14 and cleaning 16 regions.Each partition 18, 20 has an end 18E, 20E adjacent the electrode 28. Thedistance (or “gap”) between the electrode 28 and the end 18E, 20E ofeach partition 18, 20 (or between the electrode and an isolation cup,etc., on the end of each partition) is preferably quite small (e.g.,less than an inch). In some embodiments, this distance does not exceed(e.g., is smaller than) the dark-space distance that arises underexisting process conditions. As is adequately defined in plasma physics,the dark-space distance is so small that neither chemical reaction norplasma discharge can develop in this space. In some cases, the distancebetween the electrode 28 and the end 18E, 20E of each partition 18, 20(or an isolation cup, etc.) is less than about 3 mm (e.g., between about1 mm and about 3 mm). In other cases, this distance is somewhat greater(e.g., between about 1 mm and about 20 mm).

In the embodiment of FIG. 1, the divider includes optional isolationcups 22, 24. While these isolation cups 22, 24 are not required, theycan be provided to enhance the separation of the first and secondatmospheres. For example, they provide a circumferentially moreextensive (i.e., extending further about the circumference of theelectrode 28) dark space between the electrode 28 and the end 18E, 20Eof each partition 18, 20, thus tending to reduce the likelihood ofplasma discharge and chemical reaction occurring in this space.

The partial dividers 18, 20 can be formed of the same metallic materialas the walls of chamber 12. The isolation cups 22, 24 can also be formedof metallic material. However, it may be preferable to form theisolation cups 22, 24 of an electrically nonconductive material so theydo not become charged during operation. This may minimize plasmabombardment of the isolation cups 22, 24.

In certain embodiments, the divider comprises two spaced-apart wallsbounding an intermediate atmosphere 15. In these embodiments, it will beappreciated that each wall may comprise two partitions. Further, therecan be provided a vacuum pump (not shown) in communication with theintermediate atmosphere 15. FIG. 8 depicts one embodiment of thisnature, wherein the divider includes two spaced-apart walls eachcomprising two partitions. The divider in this embodiment comprises afirst wall defined by a first set of partitions 118, 120 and a secondwall defined by a second set of partitions 218, 220. The firstpartitions 118, 120 extend in a generally planar manner (e.g., generallyhorizontally) from the chamber wall (not shown) toward the electrode 28.The second partitions 218, 220 have first lengths 218A, 220A that extendin a generally planar manner (e.g., generally vertically) away from thechamber wall (e.g., the floor), and second lengths 218A, 220A thatextend convergingly toward the electrode 28. Thus, each second partitionextends upwardly from the chamber floor and then turns inwardly at anangle toward the electrode 28.

In embodiments where the divider comprises spaced-apart walls, thesewalls can be provided in a variety of different configurations. Forexample, the spaced-apart walls can be generally parallel to each other(not shown), if so desired. As noted above, a vacuum pump may be incommunication with the intermediate atmosphere 15. In some cases, theoptional vacuum pump is adapted for differential pumping of theintermediate atmosphere 15. Thus, the intermediate atmosphere 15 can bepumped differentially to 15 provide further isolation of the atmospherein the coating region 14 from the atmosphere in the cleaning region 16and vice versa.

While exemplary divider embodiments have been described and illustrated,the coating 14 and cleaning 16 regions can be separated in manydifferent ways. For example, a soft padding or the like can be attachedto the optional isolation cups 22, 24. Further, embodiments areanticipated wherein the gaseous atmospheres in the coating 14 andcleaning 16 regions are isolated without any physical barrier betweenthese regions 14, 16 (e.g., by controlling gas flows in the chamber suchthat different atmospheres are maintained in the coating and cleaningregions of the chamber). Skilled artisans will appreciate that a varietyof other means can be used for isolating the atmospheres of the coating14 and cleaning 16 regions.

The chamber 12 is provided with a gas distribution system adapted fordelivering gas 58 to both the substrate-coating region 14 and theelectrode-cleaning region 16. Preferably, the gas distribution system isadapted for delivering a precursor gas (optionally together with someinert gas) to the coating region 14, and for delivering a sputtering gas(preferably an inert sputtering gas, such as argon or another noble gas)to the cleaning region 16. For example, the gas distribution system cancomprise a supply of a desired precursor gas and a gas line 48 fordelivering the precursor gas to the coating region 14. Conjointly, thegas distribution system can comprise a supply of a desired sputteringgas and a gas line 50 for delivering the sputtering gas to the cleaningregion 16. In some cases, the gas distribution system is adapted fordelivering a mix of precursor gas and inert gas to the coating region14.

In the embodiment of FIG. 1, the gas distribution system includesgas-delivery ports 52 opening into the coating region 14 of the chamber12 and gas-delivery ports 54 opening into the cleaning region 16 of thechamber 12. In this embodiment, a conduit or piping 48 extends from agas supply (not shown) to the gas-delivery ports 52 opening into thecoating region 14. Likewise, a conduit or piping 50 extends from a gassupply (not shown) to the gas-delivery ports 54 opening into thecleaning region 16. In this embodiment, conductors/anodes 56 areprovided adjacent each set of gas-delivery ports 52, 54. Theseconductors/anodes 56 provide a charge in sufficient proximity to thedelivery ports 52, 54 to maintain stable plasma. Thus, it can beappreciated that each region 14, 16 of the chamber 12 is preferablyprovided with at least one anode 56 at a location spaced away from theelectrode 28. Accordingly, an electrical field is preferably created ineach region 14, 16 of the chamber 12 between an anode 56 and theelectrode 28.

In certain embodiments, the separate conductors/anodes 56 are omittedand a gas-delivery anode is provided. For example, the gas-deliveryports 52, 54 can themselves serve as anodes. Gas-delivery anodes aredetailed in U.S. patent application Ser. No. 10/373,703, entitled“Magnetic Sputtering Systems Including Anodic Gas Distribution System”,the entire contents of which are incorporated herein by reference. Avariety of particularly advantageous gas-delivery systems and anodes aredescribed in this '703 patent application and the present chamber 12 canbe provided with any of these gas-delivery systems and anodes.

Thus, the deposition chamber 12 is preferably adapted for delivery ofdifferent gases to the coating 14 and cleaning 16 regions. Further, bothregions 14, 16 of the chamber 12 are preferably provided with separatevacuum pumps (or separate sets of vacuum pumps). For example, a firstvacuum pump can be operably connected to the coating region 14 and asecond vacuum pump can be operably connected to the cleaning region 16.In the embodiment of FIG. 1, a first vacuum pump (not shown) isconnected to the coating region 14 through a first vacuum line 44, and asecond vacuum pump (not shown) is connected to the cleaning region 16through a second vacuum line 46. By providing both regions 14, 16 of thechamber 12 with their own gas delivery and pumping, different controlledenvironments (e.g., different gaseous atmospheres) can be establishedand maintained in these 14, 16 regions.

It can be appreciated that the present system preferably includes atleast one power supply 78. In certain aspects of the invention, a mediumor low frequency power supply/generator is used. In one aspect, thepower supply 78 provides the conductors/anodes 56 with a positive DCvoltage of approximately 100 volts with a medium to low frequency signalof between about 3 KHz and about 100 KHz, and the electrode 28 receivesfrom the power supply 78 a negative DC voltage of approximately 100volts with a medium to low frequency signal of between about 3 KHz andabout 100 KHz. The medium to low frequency is used to prevent plasmainstability, which can occur when a negative electric field equilibriumbuilds-up on an electrically-nonconductive substrate 36 (e.g., glass).It is advantageous to use medium or low frequency generators, ratherthan standard high frequency generators, to discharge anelectrically-nonconductive substrate 36. Medium and low frequencygenerators are easier to build, and easier to impedance match withplasma, than high frequency generators. Thus, the optional use of amedium or low frequency power supply is a particularly advantageousaspect of the present invention.

The deposition chamber 12 itself can have a variety of suitableconfigurations. Preferably, the chamber 12 includes walls (e.g., a floor12F, ceiling 12C, and at least one sidewall 12S) bounding an interiorvolume (desirably having two isolated regions 14, 16) in which acontrolled environment can be established (e.g., desirably in which twoisolated, controlled environments can be established). The walls of thechamber 12 are preferably formed of rigid material (e.g., a metal ormetal alloy, such as stainless steel). The walls are assembled to form achamber that can accommodate a vacuum within the interior volume of thechamber. Thus, the chamber 12 is capable of being evacuated, such that acontrolled, low pressure gaseous atmosphere can be established therein.

The deposition chamber 12 preferably includes an entrance 40 forproviding substrate ingress and an exit 42 for providing substrateegress. The entrance 40 and/or the exit 42 can be a narrow slot-likeopening that is slightly larger than a desired sheet-like substrate(e.g., a glass sheet). The entrance and exit of the chamber can be ofany desired design suitable for vacuum deposition chambers. Variousentrance and exit designs are well known in the present art, and anyconventional design can be used.

A substrate support is preferably provided (e.g., located) in thesubstrate-coating region 14 of the chamber 12. Preferably, the substratesupport defines a path of substrate travel a desired portion of which isadjacent the electrode 28. The first magnet system 34 is preferablyadapted to create (e.g., in the gaseous atmosphere in thesubstrate-coating region 14) a first plasma confinement 60 about thedesired portion of the path of substrate travel. Thus, when theprecursor gas of the first gaseous atmosphere is chemically reactedand/or decomposed in the first plasma confinement 60, a substrate (inparticular, a desired surface 62 area of a substrate) on the desiredportion of the path of substrate travel is exposed to the chemicallyreacting and/or decomposing precursor gas and is thereby coated. It canbe appreciated that the desired portion of the path of substrate travelis preferably adjacent (e.g., just above) the electrode 28. In certainpreferred embodiments, the substrate 36 has a second major surface 64opposite the first major surface 62 (which surface 62 is oriented awayfrom the electrode 28 and is coated during exposure to the chemicallyreacting and/or decomposing gas in the first plasma confinement 60), andthe second major surface remains substantially uncoated followingexposure of the substrate to the first plasma confinement 60.

In the embodiments of FIGS. 1 and 8, the substrate support comprises aplurality of spaced-apart rollers 38. The rollers 38 are adapted forconveying substrates 36 through the substrate-coating region 14 of thechamber 12. The rollers 38 can be of any conventional structure. It maybe preferable to employ cylindrical aluminum rollers about which a ropeof Kevlar™ is spirally wound, with the Kevlar™ providing the surfacewith which the substrate 36 comes into direct contact.

In practicing the present invention, there is provided a film-depositionapparatus comprising: a deposition chamber 12 having a substrate-coatingregion 14 and an electrode-cleaning region 16; an electrode 28positioned in the deposition chamber 12 and having an interior cavity27; and first 34 and second 32 magnet systems disposed in the interiorcavity 27 of the electrode 28. A first gaseous atmosphere comprising aprecursor gas is preferably established in the substrate-coating region14, and a second gaseous atmosphere comprising a sputtering gas ispreferably established in the electrode-cleaning region 16. In someembodiments, a cathodic charge is delivered to the electrode 28 (e.g.,while an anodic charge is delivered to, or otherwise exists on, theelectrode 56), thereby creating in the first gaseous atmosphere plasmathat is held by the first magnet system 34 in a first plasma confinement60 and creating in the second gaseous atmosphere plasma that is held bythe second magnet system 32 in a second plasma confinement 66. Theprecursor gas in the substrate-coating region 14 is chemically reactedand/or decomposed by the action of plasma in the second plasmaconfinement 66. A substrate 36 is positioned in the substrate-coatingregion 14 and is exposed (e.g., surface 62 is exposed) to thechemically-reacting and/or decomposing precursor gas such that coatingis formed on the substrate 36 (e.g., in some cases, only on surface 62).The substrate 36 can be thus exposed by conveying the substrate 36 alonga substrate support that defines a path of substrate travel (whichdesirably extends/passes through confinement 60) a desired portion ofwhich is adjacent the electrode 28 and in the first plasma confinement60. For example, the upper surface 62 of the substrate 36 can be exposedto the first plasma confinement 60, such that coating condenses uponthis surface 62 of the substrate 36 (but not on surface 64, in someembodiments). During this substrate-coating process, the electrode 28can be rotated such that unwanted contamination (e.g., coating) iscleaned from the electrode 28. If desired, the electrode 28 can berotated continuously (e.g., in a constant clockwise or counterclockwisedirection) during operation such that contamination is cleanedcontinuously from the electrode 28. As noted above, the electrode 28 canbe cylindrical, and thus can be rotated in any desired manner (e.g.,oscillated back and forth) to remove contamination from a desiredcircumferential extent of the electrode 28 during any given electrodecleaning period or operation.

In operation, a substrate (e.g., a sheet-like substrate 36 havinggenerally-opposed upper 62 and lower 64 major surfaces) can be conveyedinto the chamber 12 on the rollers 38. For example, the substrate 36 canbe positioned on the rollers 38 (e.g., at a loading portion of the pathof substrate travel, which is typically outside the chamber 12) and therollers 38 can then be powered-up and thus rotated to advance thesubstrate 36 through the chamber entrance 40 and into the chamber 12.The rollers 38 are typically operated at a constant speed during filmdeposition, although this is by no means required. Exemplary substratespeeds range between about 100 inches per minute and about 500 inchesper minute. If so desired, the substrate 36 can be translated back andforth (i.e., moved repeatedly forward and backward) on the rollers 38during film deposition. In most cases, though, it is preferable toconvey the substrate 36 through the chamber 12 at a constant speedduring film deposition, such that the substrate 36 is coated in a singlepass through the chamber 12. Once the substrate 36 has been coated, itis conveyed through the chamber exit 42 and out of the chamber 12.

Before the chamber 12 is used for film deposition, preconditioning ispreferably performed. This preconditioning may entail pumping down thecoating 14 and cleaning 16 regions of the chamber 12 with vacuum pumps(not shown) to remove moisture and contaminants. Following thispreconditioning, gas 58 is pumped into the chamber 12 via the gasdistribution system. For example, gas 58 can be delivered (e.g.,injected or bled into) to the coating chamber 14 through a first set ofnozzles 52 and into the cleaning chamber 16 through a second set ofnozzles 54. In particular, precursor gas is delivered to the coatingregion 14, and sputtering gas is delivered to the cleaning region 16. Ifso desired, sputtering gas can be delivered to the coating region 14 ina first step to establish plasma in the first confinement 60, and theprecursor gas can be delivered to the coating region 14 in a subsequentstep when it is desired to begin film deposition. During operation, adesired total pressure is maintained in the coating region 14 byappropriate gas delivery and pumping of this region 14. Likewise, adesired total pressure is maintained in the cleaning region 16 byappropriate gas delivery and pumping of this region 16. The totalpressure maintained in the coating region 14 may vary about 0.022 mbar,while the total pressure maintained in the cleaning region 16 may rangebetween about 1 Pa and about 15 Pa. Of course, these are merelyexemplary ranges and the total pressures for various processes can bevaried as desired. An electrical field is established in each region 14,16 of the chamber 12 between the electrode 28 and the anode or anodes56. The electrical fields are established by operating the power supply78 to deliver a cathodic charge to the electrode 28 and an anodic chargeto the anode(s) 56. The power supply 78 can be operated to provide theanodes 56 with a positive DC voltage of approximately 100 volts with amedium to low frequency signal of between about 3 KHz and about 100 KHz,while the electrode 28 receives from the power supply 78 a negative DCvoltage of approximately 100 volts with a medium to low frequency signalof between about 3 KHz and about 100 KHz. The electrical field in eachregion 14, 16 converts gas therein to plasma. The plasma in the coatingregion 14 is localized in the first plasma confinement 60 by themagnetic flux lines 61 created by the first magnet system 34. Likewise,the plasma in the cleaning region 16 is localized in the secondconfinement 66 by the magnetic flux lines 61 created by the secondmagnet system 34.

The substrate 36 is conveyed through the coating region 14 of thechamber 12. In some embodiments, when the substrate 36 reaches thedesired portion of the path of substrate travel, the upper surface 62 ofthe substrate is exposed to the first plasma confinement 60 and thus tothe chemically reacting and/or decomposing precursor gas therein. As aresult, coating condenses upon this surface 62 of the substrate 36.

As noted above, gaps 41 are maintained between adjacent substrates 36 insome cases (e.g., when spaced-apart substrates are coated). Thus, theelectrode 28 will at times (e.g., when the gaps 41 are aligned with theelectrode 28) be exposed to the chemically-reacting and/or decomposingprecursor gas in the first plasma confinement 60. Thus, coating may alsocondense upon the electrode 28. In the cleaning region 16, there is nosubstrate between the electrode 28 and the plasma. Rather, the electrode28 is exposed to this plasma. Therefore, in some embodiments,positively-charged particles in this plasma are attracted to theelectrode and bombard its outer surface 123, thus sputtering awaycoating from the outer surface 123 of the electrode 28. The electrode 28can be rotated continuously during film deposition. In an alternateaspect, the cleaning process is only performed until the coating isremoved from the electrode 28 to a desired extent, whereafter thecleaning process is stopped. For example, the cleaning process can becontinued for a predetermined period of time, which assures that coatingwill removed from electrode 28 to a desired extent. As noted above, afurther aspect involves adjusting the magnetic fields in the coating 14and cleaning 16 regions of the chamber 12 such that thesubstrate-coating rate is satisfactory while the electrode-cleaning rateis sufficient to remove unwanted coating from the outer surface 123 ofthe electrode 28 without undue sputtering away of the electrode itself.

In one exemplary method, methyl methacrylate (C₅H₈O₂) is provided in thesubstrate-coating region 14 of the deposition chamber 12, along with 5volume percent argon. The methyl methacrylate and argon are delivered tothe substrate-coating region 14, for example, through a metering valveat 60 cc/sec, and a process pressure of 2.2×10⁻² mbar is maintained byappropriate pumping of the substrate-coating region 14. Theelectrode-cleaning region 16 is provided with 100% argon. The argon isdelivered to the electrode-cleaning region 16, for example, through ametering valve and a process pressure is maintained by appropriatepumping of the electrode-cleaning region 16. The anodes 56 are providedwith a positive DC voltage with a medium to low frequency signal ofbetween about 3 KHz and about 100 KHz, while the electrode 28 isprovided with a negative DC voltage with a medium to low frequencysignal of between about 3 KHz and about 100 KHz. The total area of theelectrode's outer surface 123 is about 450 cm². The electrode 28 isrotated continuously during film deposition. The substrate 36 isconveyed through the chamber 12 and the upper surface 62 of thesubstrate 36 is thus coated with plasma-polymerized methyl methacrylatefilm.

Preferably, the electrode 28 projects into both the substrate-coatingregion 14 of the chamber 12 and the electrode-cleaning region 16 of thechamber. Thus, during rotation of the electrode 28 (e.g., continuouslyin the same direction, such as clockwise or counter-clockwise), a givenpoint on the outer surface 123 of the electrode 28 preferably passesthrough the substrate-coating region 14, thereafter through theelectrode-cleaning region 16, thereafter through the substrate-coatingregion 14 again, thereafter through the electrode-cleaning region 16again, and so on. Preferably, gas passage between the substrate-coatingregion 14 and the electrode-cleaning region 16 is prevented orsubstantially prevented. In certain embodiments, a substrate duringcoating is positioned a desired distance from the electrode (e.g., lessthan about six inches, perhaps more preferably less than about fourinches, and perhaps more preferably less than about two inches (e.g.,about an inch or less).

While preferred embodiments of the invention have been described, itshould be understood that numerous changes, adaptations, andmodifications can be made without departing from the spirit of theinvention and the scope of the appended claims.

1. A film-deposition apparatus comprising: a) a deposition chamberhaving a substrate-coating region and an electrode-cleaning region,wherein a first gaseous atmosphere can be established in thesubstrate-coating region while a second gaseous atmosphere can beestablished in the electrode-cleaning region; b) a rotatable electrodepositioned in the deposition chamber and having an interior cavity; andc) first and second magnet systems disposed in said interior cavity. 2.The apparatus of claim 1 wherein a substrate in the substrate-coatingregion has a first major surface oriented away from the rotatableelectrode, and wherein operation of the film-deposition apparatus coatssaid first major surface of the substrate.
 3. The apparatus of claim 2wherein the substrate is a glass sheet.
 4. The apparatus of claim 1wherein the rotatable electrode has an outer surface that is sputteredclean of unwanted contamination in the electrode-cleaning region.
 5. Theapparatus of claim 1 wherein the first magnet system is oriented towardthe substrate-coating region and the second magnet system is orientedtoward the electrode-cleaning region.
 6. The apparatus of claim 1wherein the substrate-coating region contains said first gaseousatmosphere and the electrode-cleaning region contains said secondgaseous atmosphere.
 7. The apparatus of claim 6 wherein the electrode isexposed to both the first and second gaseous atmospheres.
 8. Theapparatus of claim 6 wherein the first magnet system is adapted tocreate a first plasma confinement in the first gaseous atmosphere andthe second magnet system is adapted to create a second plasmaconfinement in the second gaseous atmosphere.
 9. The apparatus of claim8 wherein the first gaseous atmosphere comprises a precursor gas and thesecond gaseous atmosphere comprises a sputtering gas.
 10. The apparatusof claim 9 wherein the sputtering gas is inert gas.
 11. The apparatus ofclaim 9 wherein the precursor gas is chemically reacted and/ordecomposed in the first plasma confinement such that coating is formedon a substrate that is exposed to the chemically-reacting and/ordecomposing precursor gas in the first plasma confinement.
 12. Theapparatus of claim 11 wherein the substrate has a first major surfaceoriented away from the rotatable electrode, and the first major surfacereceives said coating.
 13. The apparatus of claim 12 wherein thesubstrate has a second major surface oriented toward the rotatableelectrode, and the second major surface remains substantially uncoatedduring said exposure of the substrate in the first plasma confinement.14. The apparatus of claim 9 wherein the sputtering gas is converted toplasma in the second plasma confinement and bombards an outer surface ofthe electrode, thereby cleaning unwanted contamination from the outersurface of the electrode.
 15. The apparatus of claim 1 wherein therotatable electrode is cylindrical and is rotatable about itslongitudinal axis.
 16. The apparatus of claim 1 wherein the first andsecond magnet systems are stationary.
 17. The apparatus of claim 1wherein the first and second magnet systems are disposed in agenerally-opposed configuration.
 18. The apparatus of claim 1 whereinthe first and second magnet systems each comprise an elongated magneticarray.
 19. The apparatus of claim 1 wherein a substrate support ispositioned in the substrate-coating region of the deposition chamber.20. The apparatus of claim 19 wherein the substrate support is adaptedto convey a series of spaced-apart sheet-like substrates.
 21. Theapparatus of claim 19 wherein the substrate-coating region of thechamber is at a higher elevation than the electrode-cleaning region ofthe chamber, and wherein the substrate support is adapted to retain asubstrate above the rotatable electrode.
 22. The apparatus of claim 21wherein the substrate support comprises a series of spaced-aparttransport rollers adapted to convey substrates above the rotatableelectrode.
 23. The apparatus of claim 19 wherein the substrate supportdefines a path of substrate travel a desired portion of which isadjacent the electrode.
 24. The apparatus of claim 23 wherein the firstmagnet system is adapted to create a first plasma confinement about thedesired portion of the path of substrate travel.
 25. The apparatus ofclaim 23 wherein the first magnet system is adapted to create a firstplasma confinement defining a magnetic trap that closes over a surfaceof a substrate on the desired portion of the path of substrate travel.26. The apparatus of claim 24 wherein the first gaseous atmospherecomprises a precursor gas that is chemically reacted and/or decomposedin the first plasma confinement such that a substrate on the desiredportion of the path of substrate travel is exposed to thechemically-reacting and/or decomposing precursor gas and is therebycoated.
 27. The apparatus of claim 26 wherein the substrate has a firstmajor surface oriented away from the rotatable electrode, and whereinthe first major surface of the substrate is coated.
 28. The apparatus ofclaim 27 wherein the substrate has a second major surface orientedtoward the rotatable electrode, and the second major surface remainssubstantially uncoated during said exposure of the substrate in thefirst plasma confinement.
 29. The apparatus of claim 1 wherein therotatable electrode has an outer layer of low sputter rate material. 30.The apparatus of claim 29 wherein the electrode comprises a backing tubeon which the outer layer of low sputter rate material is carried. 31.The apparatus of claim 30 wherein the low sputter rate material iscarbon.
 32. The apparatus of claim 1 further comprising a gas deliverysystem adapted for delivering a precursor gas to the substrate-coatingregion and a sputtering gas to the electrode-cleaning region.
 33. Theapparatus of claim 1 wherein a first vacuum pump is operably connectedto the substrate-coating region and a second vacuum pump is operablyconnected to the electrode-cleaning region.
 34. The apparatus of claim 1wherein the deposition chamber is adapted for separate gas delivery andvacuum pumping of the substrate-coating region and theelectrode-cleaning region.
 35. The apparatus of claim 1 wherein thedeposition chamber includes a divider between the substrate-coatingregion and the electrode-cleaning region.
 36. The apparatus of claim 35wherein the divider comprises two spaced-apart walls bounding anintermediate atmosphere.
 37. The apparatus of claim 36 furthercomprising a vacuum pump in communication with the intermediateatmosphere. 38-46. (canceled)